Exam Pattern Change: The central government is preparing to change the exam pattern for JEE Advanced. The new pattern will include aptitude questions along with Physics, Chemistry, and Mathematics (PCM). Under the supervision of the Joint Admission Board (JAB), IIT experts, chaired by Professor Manindra Agarwal, Director of IIT Kanpur, will develop a roadmap for JEE Advanced reforms within six months. Following this, the action plan will be implemented in a phased manner based on pilot results and analysis.

Similar to JEE Main, the JEE Advanced exam will be conducted two to four times a year. Currently, it is held only once a year. The new plan involves conducting the exam over several days in different slots. Students will be able to take the exam at their convenience.

Inclusion of Aptitude will reduce the number of PCM questions.
Currently, JEE Advanced only includes questions from Physics, Chemistry, and Mathematics (PCM). The new plan, which includes aptitude questions, will reduce the number of PCM questions in the paper. Students attend coaching classes for PCM. The purpose of including aptitude questions is to assess the student's logical ability, mathematical skills, and problem-solving capabilities. This will make the challenging exam slightly easier. The new pattern aims to emphasize critical thinking and skills rather than just subject knowledge.

Why the need for change: New Education Policy
The New Education Policy recommends reducing the stress associated with examinations. Therefore, the plan to change the pattern is aimed at reducing student stress and dependence on coaching centers. Students experience the most stress regarding this exam. There are approximately 19,000 seats, and 1.5 to 2 lakh students appear for the exam. Parents enroll their children in coaching centers from as early as the sixth grade to help them get into IITs. The pressure of school and coaching classes causes immense stress for students. Many students are ending their lives due to their inability to cope with this excessive stress. Therefore, the demand for a change in the pattern arose to reduce this stress.

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