Due to a hamstring injury, Chapman will miss the second ODI against Pakistan
Rekha Prajapati April 01, 2025 01:27 PM

Mark Chapman, a batsman for New Zealand, will be out for Wednesday (IST)’s second Chemist Warehouse ODI against Pakistan because of a right hamstring injury. During the first ODI in Napier, Chapman was injured while fielding. An MRI scan later showed a grade one tear, which would need some short-term rehabilitation.

In order to be ready for the third and final ODI at Bay Oval on Saturday, Chapman, who recorded a career-high 132 in the series opener at McLean Park, will return to Auckland for recuperation.

Chapman will be replaced in the Hamilton lineup by Tim Seifert, a top-order batsman. Seifert enters the team after leading the run scoring charts with 249 runs at an average of 62 in a remarkable Twenty20 International series against Pakistan.

The injury was regrettable for Chapman and the squad, according to Kiwis coach Gary Stead.

After a very remarkable century in the first ODI in Napier, Mark is definitely disappointed by the news. We’re relieved that Mark’s hamstring injury is very mild and are optimistic that he can finish his recovery in time for the Mount’s last summer competition.

Although players with complete national and domestic contracts were given precedence when choosing the ODI team, Stead said that Seifert’s recent performance justified his inclusion.

“It’s fantastic to be able to rely on a guy with Tim’s expertise, especially because this group has a number of fresh players. After a fantastic Twenty20 series, he’s in form and offers another potent top-order batting option going into tomorrow’s crucial game, Stead continued.

Throughout the white-ball series, the Kiwis have dominated Pakistan at home. Following their decisive 4-1 series victory in the shortest format, the Black Caps got off to a strong start in the 50-over format thanks to Chapman’s 132 and a late Pakistani batting collapse that was set off by Jamie Smith and Jacob Duffy, which resulted in a 73-run victory.

 

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